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Oxides, Oxides, And More Oxides - Microelectron...


The presence of such structural ripples in complex oxides, which used to be known as nonbendable ceramics, is an exciting new scientific discovery and a future playground to explore strong strain gradient-induced physical phenomena such as flexoelectric effects. However, in microelectronic devices, these tiny ripples can induce device-to-device variability.




Oxides, oxides, and more oxides - Microelectron...


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In the majority of silicon dioxides, the silicon atom shows tetrahedral coordination, with four oxygen atoms surrounding a central Si atom (see 3-D Unit Cell). Thus, SiO2 forms 3-dimensional network solids in which each silicon atom is covalently bonded in a tetrahedral manner to 4 oxygen atoms. In contrast, CO2 is a linear molecule. The starkly different structures of the dioxides of carbon and silicon are a manifestation of the double bond rule.


Silicon dioxide will neutralise basic metal oxides (e.g. sodium oxide, potassium oxide, lead(II) oxide, zinc oxide, or mixtures of oxides, forming silicates and glasses as the Si-O-Si bonds in silica are broken successively).[8] As an example the reaction of sodium oxide and SiO2 can produce sodium orthosilicate, sodium silicate, and glasses, dependent on the proportions of reactants:[11]


For many of these applications, atomic layer deposition (ALD) is the method of choice for depositing uniform thin films of metals, metal oxides and metal chalcogenides on nanostructured substrates. ALD provides a constant film-growth rate within a defined temperature window. This temperature window is important in the selection of precursors for multicomponent thin films. This is especially critical for calcium which is mostly alloyed with other metal oxides and chalcogenides for functional material applications. One of the most widely used Ca precursors, Ca(tmhd)2, has a narrow, high-temperature ALD growth window of 325-400oC for CaS .5 Another precursor, Ca(i-Pr3Cp)2, has a lower temperature range for ALD of CaO films (200-300 oC)6 but not as well adopted. Other types of volatile Ca precursors such as fluoroalkoxides, fluorinated ß-diketonates and aminoboranes are known, but as of now not reported for use in ALD applications. 041b061a72


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